Patel says SMIC's Shanghai fab has 45 to 50 high-end lithography tools enabling 60,000 wafers monthly at seven nanometer.
“Shanghai has anywhere from 45 to 50 high end immersion lithography tools is is what's like believed by intelligence as well as like many other folks.”
Patel explains TSMC and Intel achieved seven nanometer manufacturing using older DUV lithography with multi-patterning technique.
“TSMC and Intel were able to do it with what's called multi patterning DUV, deep ultraviolet. Right? So that just means they use the DUV lithography many times, right, for simplicity's sake.”